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The characteristics of CdxSn1―xO films prepared by RF magnetron sputtering from powder targetsZHOU, Y. W; LIU, X; WU, F. Y et al.Surface & coatings technology. 2013, Vol 228, issn 0257-8972, S150-S154, SUP1Conference Paper

The structure and properties of chromium diboride coatings deposited by pulsed magnetron sputtering of powder targetsAUDRONIS, M; KELLY, P. J; ARNELL, R. D et al.Surface & coatings technology. 2005, Vol 200, Num 5-6, pp 1366-1371, issn 0257-8972, 6 p.Conference Paper

The influence of target surface morphology on the deposition flux during direct-current magnetron sputteringBOYDENS, F; LEROY, W. P; PERSOONS, R et al.Thin solid films. 2013, Vol 531, pp 32-41, issn 0040-6090, 10 p.Article

Deposition of multicomponent chromium boride based coatings by pulsed magnetron sputtering of powder targetsAUDRONIS, M; KELLY, P. J; AMELL, R. D et al.Surface & coatings technology. 2005, Vol 200, Num 5-6, pp 1616-1623, issn 0257-8972, 8 p.Conference Paper

The Effect of Compositions on the Structure and Properties of As-Prepared and Annealed CdxSnyZn1―x―yO FilmsYAN WEN ZHOU; PENG FU ZHU; FA YU WU et al.Journal of nanoelectronics and optoelectronics. 2013, Vol 8, Num 2, pp 182-187, issn 1555-130X, 6 p.Article

Sputter deposited UPON thin films from powder target as electrolyte for thin film battery applicationsNIMISHA, C. S; YELLARESWAR RAO, K; VENKATESH, G et al.Thin solid films. 2011, Vol 519, Num 10, pp 3401-3406, issn 0040-6090, 6 p.Article

Influence of annealing on thermoelectric properties of bismuth telluride films grown via radio frequency magnetron sputteringHU HUANG; LUAN, Wei-Ling; TU, Shan-Tung et al.Thin solid films. 2009, Vol 517, Num 13, pp 3731-3734, issn 0040-6090, 4 p.Article

The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder targetKARTHIKEYAN, Sreejith; HILL, Arthur E; PILKINGTON, Richard D et al.Thin solid films. 2014, Vol 550, pp 140-144, issn 0040-6090, 5 p.Article

Growth of ZnO/sapphire heteroepitaxial thin films by radio-frequency sputtering with a raw powder targetSEO, S. H; KANG, H. C.Thin solid films. 2010, Vol 518, Num 18, pp 5164-5168, issn 0040-6090, 5 p.Article

Single step deposition method for nearly stoichiometric CuInSe2 thin filmsKARTHIKEYAN, Sreejith; HILL, Arthur E; PILKINGTON, Richard D et al.Thin solid films. 2011, Vol 519, Num 10, pp 3107-3112, issn 0040-6090, 6 p.Article

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